HIGH-TEMPERATURE STABILITY OF CRSI(W)-N FILMS

被引：9

作者：

BRUCKNER, W ^{[1
]}

GRIESSMANN, H ^{[1
]}

MONCH, JI ^{[1
]}

SCHUBERT, G ^{[1
]}

HEINRICH, A ^{[1
]}

机构：

[1] SMT & HYBRID GMBH,O-8012 DRESDEN,GERMANY

来源：

THIN SOLID FILMS | 1992年 / 221卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90807-N

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The annealing characteristics of resistive Cr74Si24W2-N films were investigated at different nitrogen contents. In addition to studies of the stability up to about 450-degrees-C, the high temperature stability was measured at storage up to about 600-degrees-C, especially over the resistivity range 1800-2700 muOMEGA cm. As to the resistance drift, continuation of the annealing processes in the internal part of the films dominates during temperature storage down to about 100 K below the annealing temperature. At lower temperatures surface processes prevail. In favourable cases the resistance drift at 540-degrees-C 100 h amounts to about 3%.

引用

页码：140 / 146

页数：7

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