FORMATION AND DECAY OF METASTABLE FLUORINE-ATOMS IN PULSED FLUOROCARBON OXYGEN DISCHARGES MONITORED BY LASER-INDUCED FLUORESCENCE

被引：11

作者：

HANSEN, SG ^{[1
]}

LUCKMAN, G ^{[1
]}

NIEMAN, GC ^{[1
]}

COLSON, SD ^{[1
]}

机构：

[1] YALE UNIV,STERLING CHEM LAB,NEW HAVEN,CT 06511

来源：

APPLIED PHYSICS LETTERS | 1990年 / 56卷 / 08期

关键词：

D O I：

10.1063/1.102692

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The temporal profiles of metastable F(4 P3/2) and Ar(1s5) and emitting F(4D05/2) and Ar(2p2) in a sharp-edged, pulsed CF4/O2/Ar (87.5/10.4/2.1) discharge are discussed. All four states are so short lived that there is no net accumulation during the discharge pulse and the profiles merely reflect the formation rate. For Ar, electron impact on the ground state leads to both excited states. Their similar profiles mirror the electron excitation function. For excited F, two channels are open: electron impact on CF 4, and electron impact on ground-state F which accumulates during the discharge pulse. The fact that metastable F is rapidly quenched in the gas phase indicates that it is not a major etchant of silicon or silicon nitride as was recently suggested in the literature.

引用

页码：719 / 721

页数：3

共 25 条

[1] PRODUCT DISTRIBUTIONS IN THE REACTIONS OF EXCITED NOBLE-GAS ATOMS WITH HALOGEN-CONTAINING COMPOUNDS [J].