HIGHLY CONDUCTIVE AND WIDE BAND-GAP AMORPHOUS-MICROCRYSTALLINE MIXED-PHASE SILICON FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION

被引：50

作者：

NISHIDA, S

TASAKI, H

KONAGAI, M

TAKAHASHI, K

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 04期

关键词：

D O I：

10.1063/1.336071

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1427 / 1431

页数：5

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