REACTIONS OF ATOMIC-HYDROGEN IN THE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON BY GLOW-DISCHARGE AND REACTIVE SPUTTERING

被引：34

作者：

KAMPAS, FJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 09期

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D O I：

10.1063/1.331513

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：6408 / 6412

页数：5

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