REDUCTION OF SUBSTRATE INTERFERENCE IN RAMAN-SPECTROSCOPY OF SUB-MICRON TITANIA COATINGS

被引：12

作者：

HSU, LS ^{[1
]}

SHE, CY ^{[1
]}

EXARHOS, GJ ^{[1
]}

机构：

[1] COLORADO STATE UNIV, DEPT PHYS, FT COLLINS, CO 80523 USA

来源：

APPLIED OPTICS | 1984年 / 23卷 / 18期

关键词：

D O I：

10.1364/AO.23.003049

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3049 / 3051

页数：3

共 12 条

[1] RAMAN-SCATTERING IN PURE AND HYDROGENATED AMORPHOUS-GERMANIUM AND SILICON
BERMEJO, D
CARDONA, M
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1979, 32 (1-3) : 405 - 419
[2] RAMAN MEASUREMENTS OF STRESS IN SILICON-ON-SAPPHIRE DEVICE STRUCTURES
BRUECK, SRJ
TSAUR, BY
FAN, JCC
MURPHY, DV
DEUTSCH, TF
SILVERSMITH, DJ
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (10) : 895 - 898
[3] RAPID DETERMINATION OF LOW CONCENTRATIONS OF ANATASE IN RUTILE TIO2 PIGMENTS BY RAMAN SPECTROSCOPY
CAPWELL, RJ
SPAGNOLO, F
DESESA, MA
[J]. APPLIED SPECTROSCOPY, 1972, 26 (05) : 537 - &
[4] CHARACTERIZATION OF ION-IMPLANTED AND LASER ANNEALED POLYCRYSTALLINE SI BY A RAMAN MICRO-PROBE
NAKASHIMA, S
INOUE, Y
MIYAUCHI, M
MITSUISHI, A
NISHIMURA, T
FUKUMOTO, T
AKASAKA, Y
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (06) : 524 - 526
[5] INTERFERENCE-ENHANCED RAMAN-SCATTERING OF VERY THIN TITANIUM AND TITANIUM-OXIDE FILMS
NEMANICH, RJ
TSAI, CC
CONNELL, GAN
[J]. PHYSICAL REVIEW LETTERS, 1980, 44 (04) : 273 - 276
[6] RAMAN SCATTERING BY SILICON AND GERMANIUM
PARKER, JH
FELDMAN, DW
ASHKIN, M
[J]. PHYSICAL REVIEW, 1967, 155 (03): : 712 - &
[7] STRUCTURAL CHARACTERIZATION OF TIO2 OPTICAL COATINGS BY RAMAN-SPECTROSCOPY
PAWLEWICZ, WT
EXARHOS, GJ
CONAWAY, WE
[J]. APPLIED OPTICS, 1983, 22 (12): : 1837 - 1840
[8] HIGH BAND-GAP OXIDE OPTICAL COATINGS FOR 0.25 AND 1.06 MU-M FUSION LASERS
PAWLEWICZ, WT
HAYS, DD
MARTIN, PM
[J]. THIN SOLID FILMS, 1980, 73 (01) : 169 - 175
[9] CHEMICAL-REACTION AT THE AL-GAAS INTERFACE
SCHWARTZ, GP
CHO, AY
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 607 - 610
[10] ION-BEAM SPUTTER DEPOSITION OF OPTICAL COATINGS
SITES, JR
GILSTRAP, P
RUJKORAKARN, R
[J]. OPTICAL ENGINEERING, 1983, 22 (04) : 447 - 449

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