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PHYSICAL AND ELECTRICAL-PROPERTIES OF SILICON-NITRIDE AND SILICON NITRIDE-INDIUM PHOSPHIDE INTERFACE
被引:10
作者
:
FUJIWARA, I
论文数:
0
引用数:
0
h-index:
0
FUJIWARA, I
YAJIMA, Y
论文数:
0
引用数:
0
h-index:
0
YAJIMA, Y
FUKUZAWA, T
论文数:
0
引用数:
0
h-index:
0
FUKUZAWA, T
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1989年
/ 136卷
/ 09期
关键词
:
D O I
:
10.1149/1.2097526
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:2629 / 2632
页数:4
相关论文
共 22 条
[1]
DENSITY OF STATES IN GAP OF TETRAHEDRALLY BONDED AMORPHOUS-SEMICONDUCTORS
[J].
ADLER, D
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,CTR MAT SCI & ENGN,CAMBRIDGE,MA 02139
ADLER, D
.
PHYSICAL REVIEW LETTERS,
1978,
41
(25)
:1755
-1758
[2]
MODEL FOR ELECTRONIC-STRUCTURE OF AMORPHOUS-SEMICONDUCTORS
[J].
ANDERSON, PW
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
ANDERSON, PW
.
PHYSICAL REVIEW LETTERS,
1975,
34
(15)
:953
-955
[3]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
:266
-+
[4]
MECHANISMS OF PLASMA-ENHANCED SILICON-NITRIDE DEPOSITION USING SIH4-N2 MIXTURE
[J].
DUN, H
论文数:
0
引用数:
0
h-index:
0
DUN, H
;
PAN, P
论文数:
0
引用数:
0
h-index:
0
PAN, P
;
WHITE, FR
论文数:
0
引用数:
0
h-index:
0
WHITE, FR
;
DOUSE, RW
论文数:
0
引用数:
0
h-index:
0
DOUSE, RW
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(07)
:1555
-1563
[5]
ELECTRICAL CHARACTERISTICS OF SILICON NITRIDE-GALLIUM ARSENIDE INTERFACE
[J].
FOSTER, JE
论文数:
0
引用数:
0
h-index:
0
FOSTER, JE
;
SWARTZ, JM
论文数:
0
引用数:
0
h-index:
0
SWARTZ, JM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(11)
:1410
-+
[6]
DANGLING BONDS IN MEMORY-QUALITY SILICON-NITRIDE FILMS
[J].
论文数:
引用数:
h-index:
机构:
FUJITA, S
;
SASAKI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Kyoto Univ, Dep of Electrical, Engineering, Kyoto, Jpn, Kyoto Univ, Dep of Electrical Engineering, Kyoto, Jpn
SASAKI, A
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(02)
:398
-402
[7]
VARIATIONS OF TRAP STATES AND DANGLING BONDS IN CVD-SI3N4 LAYER ON SI SUBSTRATE BY NH3/SIH4 RATIO
[J].
FUJITA, S
论文数:
0
引用数:
0
h-index:
0
FUJITA, S
;
TOYOSHIMA, H
论文数:
0
引用数:
0
h-index:
0
TOYOSHIMA, H
;
NISHIHARA, M
论文数:
0
引用数:
0
h-index:
0
NISHIHARA, M
;
SASAKI, A
论文数:
0
引用数:
0
h-index:
0
SASAKI, A
.
JOURNAL OF ELECTRONIC MATERIALS,
1982,
11
(04)
:795
-812
[8]
FUJITA S, 1982, JPN J APPL PHYS, V22, pL100
[9]
VALENCE-ALTERNATION MODEL FOR LOCALIZED GAP STATES IN LONE-PAIR SEMICONDUCTORS
[J].
KASTNER, M
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
KASTNER, M
;
ADLER, D
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
ADLER, D
;
FRITZSCHE, H
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
FRITZSCHE, H
.
PHYSICAL REVIEW LETTERS,
1976,
37
(22)
:1504
-1507
[10]
OPTICALLY INDUCED ELECTRON-SPIN RESONANCE IN DOPED AMORPHOUS SILICON
[J].
KNIGHTS, JC
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
KNIGHTS, JC
;
BIEGELSEN, DK
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
BIEGELSEN, DK
;
SOLOMON, I
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
SOLOMON, I
.
SOLID STATE COMMUNICATIONS,
1977,
22
(02)
:133
-137
←
1
2
3
→
共 22 条
[1]
DENSITY OF STATES IN GAP OF TETRAHEDRALLY BONDED AMORPHOUS-SEMICONDUCTORS
[J].
ADLER, D
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,CTR MAT SCI & ENGN,CAMBRIDGE,MA 02139
ADLER, D
.
PHYSICAL REVIEW LETTERS,
1978,
41
(25)
:1755
-1758
[2]
MODEL FOR ELECTRONIC-STRUCTURE OF AMORPHOUS-SEMICONDUCTORS
[J].
ANDERSON, PW
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
ANDERSON, PW
.
PHYSICAL REVIEW LETTERS,
1975,
34
(15)
:953
-955
[3]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
:266
-+
[4]
MECHANISMS OF PLASMA-ENHANCED SILICON-NITRIDE DEPOSITION USING SIH4-N2 MIXTURE
[J].
DUN, H
论文数:
0
引用数:
0
h-index:
0
DUN, H
;
PAN, P
论文数:
0
引用数:
0
h-index:
0
PAN, P
;
WHITE, FR
论文数:
0
引用数:
0
h-index:
0
WHITE, FR
;
DOUSE, RW
论文数:
0
引用数:
0
h-index:
0
DOUSE, RW
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(07)
:1555
-1563
[5]
ELECTRICAL CHARACTERISTICS OF SILICON NITRIDE-GALLIUM ARSENIDE INTERFACE
[J].
FOSTER, JE
论文数:
0
引用数:
0
h-index:
0
FOSTER, JE
;
SWARTZ, JM
论文数:
0
引用数:
0
h-index:
0
SWARTZ, JM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(11)
:1410
-+
[6]
DANGLING BONDS IN MEMORY-QUALITY SILICON-NITRIDE FILMS
[J].
论文数:
引用数:
h-index:
机构:
FUJITA, S
;
SASAKI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Kyoto Univ, Dep of Electrical, Engineering, Kyoto, Jpn, Kyoto Univ, Dep of Electrical Engineering, Kyoto, Jpn
SASAKI, A
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(02)
:398
-402
[7]
VARIATIONS OF TRAP STATES AND DANGLING BONDS IN CVD-SI3N4 LAYER ON SI SUBSTRATE BY NH3/SIH4 RATIO
[J].
FUJITA, S
论文数:
0
引用数:
0
h-index:
0
FUJITA, S
;
TOYOSHIMA, H
论文数:
0
引用数:
0
h-index:
0
TOYOSHIMA, H
;
NISHIHARA, M
论文数:
0
引用数:
0
h-index:
0
NISHIHARA, M
;
SASAKI, A
论文数:
0
引用数:
0
h-index:
0
SASAKI, A
.
JOURNAL OF ELECTRONIC MATERIALS,
1982,
11
(04)
:795
-812
[8]
FUJITA S, 1982, JPN J APPL PHYS, V22, pL100
[9]
VALENCE-ALTERNATION MODEL FOR LOCALIZED GAP STATES IN LONE-PAIR SEMICONDUCTORS
[J].
KASTNER, M
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
KASTNER, M
;
ADLER, D
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
ADLER, D
;
FRITZSCHE, H
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CTR MAT SCI & ENGN,DEPT PHYS,CAMBRIDGE,MA 02139
FRITZSCHE, H
.
PHYSICAL REVIEW LETTERS,
1976,
37
(22)
:1504
-1507
[10]
OPTICALLY INDUCED ELECTRON-SPIN RESONANCE IN DOPED AMORPHOUS SILICON
[J].
KNIGHTS, JC
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
KNIGHTS, JC
;
BIEGELSEN, DK
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
BIEGELSEN, DK
;
SOLOMON, I
论文数:
0
引用数:
0
h-index:
0
机构:
XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
SOLOMON, I
.
SOLID STATE COMMUNICATIONS,
1977,
22
(02)
:133
-137
←
1
2
3
→