THERMAL-STABILITY AND GROWTH-KINETICS OF CO2SI AND COSI IN THIN-FILM REACTIONS

被引：86

作者：

TU, KN ^{[1
]}

OTTAVIANI, G ^{[1
]}

THOMPSON, RD ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI,ITHACA,NY 14853

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 06期

关键词：

D O I：

10.1063/1.331223

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：4406 / 4410

页数：5

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共 12 条

[1] GROWTH-KINETICS OF PLANAR BINARY DIFFUSION COUPLES - THIN-FILM CASE VERSUS BULK CASES
GOSELE, U
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) : 3252 - 3260
[2] SOME ASPECTS OF THE GROWTH OF DIFFUSION LAYERS IN BINARY SYSTEMS
KIDSON, GV
[J]. JOURNAL OF NUCLEAR MATERIALS, 1961, 3 (01) : 21 - 29
[3] INTERACTIONS IN CO-SI THIN-FILM SYSTEM .1. KINETICS
LAU, SS
MAYER, JW
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 4005 - 4010
[4] GOLD-ALUMINUM THIN-FILM INTERACTIONS AND COMPOUND FORMATION
MAJNI, G
NOBILI, C
OTTAVIANI, G
COSTATO, M
GALLI, E
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) : 4047 - 4054
[5] INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS
OLOWOLAFE, JO
NICOLET, MA
MAYER, JW
[J]. THIN SOLID FILMS, 1976, 38 (02) : 143 - 150
[6] REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS
OTTAVIANI, G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05): : 1112 - 1119
[7] DISSOCIATION OF PTSI, NISI, AND PDGE IN PRESENCE OF PT, NI AND PD FILMS, RESPECTIVELY
OTTAVIANI, G
MAJNI, G
CANALI, C
[J]. APPLIED PHYSICS, 1979, 18 (03): : 285 - 289
[8] TU KN, 1975, APPL PHYS LETT, V27, P221, DOI 10.1063/1.88436
[9] STRUCTURE AND GROWTH KINETICS OF NI2SI ON SILICON
TU, KN
CHU, WK
MAYER, JW
[J]. THIN SOLID FILMS, 1975, 25 (02) : 403 - 413
[10] TU KN, 1978, THIN FILMS INTERDIFF, pCH10