CHARACTERIZATION OF A REACTIVE BROAD BEAM RADIO-FREQUENCY ION-SOURCE

被引：10

作者：

LOSSY, R

ENGEMANN, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584025

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：284 / 287

页数：4

共 13 条

[1]

ARZT T, 1983, 16TH INT C PHEN ION

[2]

FOSNIGHT VV, 1983, EBD700205 FIN PROGR

[3] A NOVEL ANISOTROPIC DRY ETCHING TECHNIQUE [J].

GEIS, MW ;

LINCOLN, GA ;

EFREMOW, N ;

PIACENTINI, WJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1390-1393

[4] BEAM OPTICS FOR ION EXTRACTION WITH A HIGH-VOLTAGE RATIO ACCELERATION DECELERATION SYSTEM [J].

GREEN, TS .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (07) :1165-1171

[5] BROAD-BEAM ION SOURCES - PRESENT STATUS AND FUTURE-DIRECTIONS [J].

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :764-771

[6] RF MULTIPOLAR PLASMA FOR BROAD AND REACTIVE ION-BEAMS [J].

LEJEUNE, C ;

GRANDCHAMP, JP ;

KESSI, O ;

GILLES, JP .

VACUUM, 1986, 36 (11-12) :837-840

[7] OPTIMIZATION OF PERMANENT-MAGNET PLASMA CONFINEMENT [J].

LEUNG, KN ;

SAMEC, TK ;

LAMM, A .

PHYSICS LETTERS A, 1975, A 51 (08) :490-492

[8] RF-BROAD-BEAM ION-SOURCE FOR REACTIVE SPUTTERING [J].

LOSSY, R ;

ENGEMANN, J .

VACUUM, 1986, 36 (11-12) :973-976

[9]

MULLER J, 1987, INT S TRENDS NEW APP

[10]

OSHER JE, 1971, OCT P S ION SOURC FO

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