RF-BROAD-BEAM ION-SOURCE FOR REACTIVE SPUTTERING

被引：10

作者：

LOSSY, R

ENGEMANN, J

机构：

来源：

VACUUM | 1986年 / 36卷 / 11-12期

关键词：

This work was supported by the Volkswagen-Stiftung;

D O I：

10.1016/0042-207X(86)90150-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：973 / 976

页数：4

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