BROAD-BEAM ION SOURCES - PRESENT STATUS AND FUTURE-DIRECTIONS

被引：44

作者：

KAUFMAN, HR ^{[1
]}

机构：

[1] COMMONWEALTH SCI CORP,ALEXANDRIA,VA 22314

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573810

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：764 / 771

页数：8

共 14 条

[1] CUOMO JJ, 1984, Patent No. 4466403
[2] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS
HARPER, JME
CUOMO, JJ
KAUFMAN, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 737 - 756
[3] HARPER JME, 1984, ION BOMBARDMENT MODI, P127
[4] ION MILLING (ION-BEAM ETCHING), 1975-1978 - BIBLIOGRAPHY
HAWKINS, DT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (04): : 1051 - 1071
[5] ION MILLING (ION-BEAM ETCHING), 1954-1975 - BIBLIOGRAPHY
HAWKINS, DT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1389 - 1398
[6] Kaufman H.R., 1974, ADV ELECT ELECT PHYS, V36, P265
[7] TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING
KAUFMAN, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 272 - 276
[8] ION-SOURCE DESIGN FOR INDUSTRIAL APPLICATIONS
KAUFMAN, HR
ROBINSON, RS
[J]. AIAA JOURNAL, 1982, 20 (06) : 745 - 760
[9] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY
KAUFMAN, HR
CUOMO, JJ
HARPER, JME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736
[10] DEVELOPMENTS IN BROAD-BEAM, ION-SOURCE TECHNOLOGY AND APPLICATIONS
KAUFMAN, HR
HARPER, JME
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 764 - 767