DEVELOPMENTS IN BROAD-BEAM, ION-SOURCE TECHNOLOGY AND APPLICATIONS

被引：18

作者：

KAUFMAN, HR ^{[1
]}

HARPER, JME ^{[1
]}

CUOMO, JJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1116/1.571822

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：764 / 767

页数：4

共 18 条

[1] AN INVESTIGATION OF ION-BOMBARDED AND ANNEALED (111) SURFACES OF GE BY SPECTROSCOPIC ELLIPSOMETRY
ASPNES, DE
STUDNA, AA
[J]. SURFACE SCIENCE, 1980, 96 (1-3) : 294 - 306
[2] DEPENDENCE OF RESIDUAL DAMAGE ON TEMPERATURE DURING AR+ SPUTTER CLEANING OF SILICON
BEAN, JC
BECKER, GE
PETROFF, PM
SEIDEL, TE
[J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) : 907 - 913
[3] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION
CUOMO, JJ
HARPER, JME
GUARNIERI, CR
YEE, DS
ATTANASIO, LJ
ANGILELLO, J
WU, CT
HAMMOND, RH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 349 - 354
[4] SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS
GAUTHERIN, G
WEISSMANTEL, C
[J]. THIN SOLID FILMS, 1978, 50 (MAY) : 135 - 144
[5] HARPER JME, 1981, J ELECTROCHEM SOC, V128, P1077, DOI 10.1149/1.2127554
[6] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS
HARPER, JME
CUOMO, JJ
KAUFMAN, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 737 - 756
[7] EFFECT OF ION IRRADIATION ON ADHERENCE OF GERMANIUM FILMS
HIRSCH, EH
VARGA, IK
[J]. THIN SOLID FILMS, 1978, 52 (03) : 445 - 452
[8] MODIFICATION OF EVAPORATED CHROMIUM BY CONCURRENT ION-BOMBARDMENT
HOFFMAN, DW
GAERTTNER, MR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 425 - 428
[9] KAUFMAN H, UNPUB
[10] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY
KAUFMAN, HR
CUOMO, JJ
HARPER, JME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736

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