EXCEPTIONALLY LARGE ENHANCEMENT OF INP (110) OXIDATION RATE BY CESIUM CATALYST

被引:41
作者
SOUKIASSIAN, P [1 ]
BAKSHI, MH [1 ]
HURYCH, Z [1 ]
机构
[1] NO ILLINOIS UNIV,DEPT PHYS,DE KALB,IL 60115
关键词
D O I
10.1063/1.337902
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2679 / 2681
页数:3
相关论文
共 29 条
[1]  
CHYE PW, 1978, SURF SCI, V88, P2792
[2]   SILICON SURFACES - METALLIC CHARACTER, OXIDATION AND ADHESION [J].
CROS, A .
JOURNAL DE PHYSIQUE, 1983, 44 (06) :707-711
[3]  
DERRIEN J, 1983, SURF SCI LETT, V124, P135
[4]   HEATS OF CHEMISORPTION ON PROMOTED IRON SURFACES AND ROLE OF ALKALI IN FISCHER-TROPSCH SYNTHESIS [J].
DRY, ME ;
SHINGLES, T ;
BOSHOFF, LJ ;
OOSTHUIZ.GJ .
JOURNAL OF CATALYSIS, 1969, 15 (02) :190-&
[5]   MICROSCOPIC CONTROL OF SEMICONDUCTOR SURFACE OXIDATION [J].
FRANCIOSI, A ;
CHANG, S ;
PHILIP, P ;
CAPRILE, C ;
JOYCE, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :933-937
[6]   ELECTRONIC PROMOTERS AND SEMICONDUCTOR OXIDATION - ALKALI-METALS ON SI(111) SURFACES [J].
FRANCIOSI, A ;
SOUKIASSIAN, P ;
PHILIP, P ;
CHANG, S ;
WALL, A ;
RAISANEN, A ;
TROULLIER, N .
PHYSICAL REVIEW B, 1987, 35 (02) :910-913
[7]   ENHANCEMENT OF SI OXIDATION BY CERIUM OVERLAYERS AND FORMATION OF CERIUM SILICATE [J].
HILLEBRECHT, FU ;
RONAY, M ;
RIEGER, D ;
HIMPSEL, FJ .
PHYSICAL REVIEW B, 1986, 34 (08) :5377-5380
[8]   PROBING THE TRANSITION LAYER AT THE SIO2-SI INTERFACE USING CORE LEVEL PHOTOEMISSION [J].
HOLLINGER, G ;
HIMPSEL, FJ .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :93-95
[9]   OXYGEN-CHEMISORPTION AND OXIDE FORMATION ON SI(111) AND SI(100) SURFACES [J].
HOLLINGER, G ;
HIMPSEL, FJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :640-645
[10]   MULTIPLE-BONDING CONFIGURATIONS FOR OXYGEN ON SILICON SURFACES [J].
HOLLINGER, G ;
HIMPSEL, FJ .
PHYSICAL REVIEW B, 1983, 28 (06) :3651-3653