FAST HYDROGEN DIFFUSION IN AMORPHOUS-SILICON

被引：13

作者：

PETROVAKOCH, V

ZEINDL, HP

HERION, J

BEYER, W

机构：

[1] UNIV BUNDESWEHR, FAK ELEKTROTECH, D-8014 NEUBIBERG, FED REP GER

[2] FORSCHUNGSZENTRUM JULICH, INST GRENZFLACHENFORSCH & VAKUUMTECH, D-5170 JULICH 1, FED REP GER

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 97-8卷

关键词：

D O I：

10.1016/0022-3093(87)90193-1

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：807 / 810

页数：4

共 7 条

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[2]

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[5] THE DIFFUSION OF HYDROGEN IN AMORPHOUS-SILICON [J].

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[6] POST-HYDROGENATION OF CVD DEPOSITED A-SI FILMS [J].

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JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) :291-296

[7] EXO-DIFFUSION OF HYDROGEN IN AMORPHOUS-SILICON [J].

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