ABSENCE OF HILLOCK FORMATION IN EPITAXIAL LEAD FILMS

被引：30

作者：

LAHIRI, SK ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 06期

关键词：

D O I：

10.1063/1.321961

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2791 / 2793

页数：3

共 16 条

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[7] HILLOCK GROWTH ON VACUUM-DEPOSITED ALUMINUM FILMS [J].

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[8]

HEURLE FM, 1968, T METALL SOC AIME, V242, P502

[9] STRESS RELIEF AND HILLOCK FORMATION IN THIN LEAD FILMS [J].

LAHIRI, SK .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (07) :3172-&

[10] REVERSIBLE HILLOCK GROWTH IN THIN FILMS [J].

LAHIRI, SK ;

WELLS, OC .

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