A SIMPLIFIED VISCOELASTIC MODEL FOR THE THERMAL GROWTH OF THIN SIO2-FILMS

被引：19

作者：

RODA, GC

SANTARELLI, F

SARTI, GC

机构：

[1] Univ di Bologna, Istituto di, Impianti Chimici, Bologna, Italy, Univ di Bologna, Istituto di Impianti Chimici, Bologna, Italy

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 08期

关键词：

D O I：

10.1149/1.2114252

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

27

引用

收藏

页码：1909 / 1913

页数：5

相关论文

共 27 条

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