AN ELECTRON-SPIN-RESONANCE STUDY OF THE STRUCTURE OF PLASMA-DEPOSITED SILICON-OXYNITRIDE FILMS

被引：6

作者：

DENISSE, CMM ^{[1
]}

JANSSEN, JFM ^{[1
]}

HABRAKEN, FHPM ^{[1
]}

VANDERWEG, WF ^{[1
]}

SCHUIVENS, EGP ^{[1
]}

机构：

[1] ADV SEMICOND MAT EUROPE,3723 BG BILTHOVEN,NETHERLANDS

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期

关键词：

D O I：

10.1063/1.339686

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：832 / 836

页数：5

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