CHARACTERIZATION OF SOLID-PHASE EPITAXIALLY-GROWN SILICON FILMS ON SIO2

被引：12

作者：

TAMURA, M ^{[1
]}

TOKUYAMA, T ^{[1
]}

YAMAMOTO, H ^{[1
]}

ISHIWARA, H ^{[1
]}

FURUKAWA, S ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,DEPT APPL ELECTR,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1984年 / 23卷 / 10期

关键词：

D O I：

10.1143/JJAP.23.1294

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1294 / 1299

页数：6

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