UHF BULK-ACOUSTIC-WAVE FILTERS UTILIZING THIN ZNO/SIO2-DIAPHRAGMS ON SILICON

被引：17

作者：

NAKAMURA, K

OHASHI, Y

SHIMIZU, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 03期

关键词：

D O I：

10.1143/JJAP.25.371

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：371 / 375

页数：5

共 19 条

[1] A WATER-AMINE-COMPLEXING AGENT SYSTEM FOR ETCHING SILICON [J].

FINNE, RM ;

KLEIN, DL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :965-&

[2] FUNDAMENTAL-MODE VHF-UHF MINIATURE ACOUSTIC RESONATORS AND FILTERS ON SILICON [J].

GRUDKOWSKI, TW ;

BLACK, JF ;

REEDER, TM ;

CULLEN, DE ;

WAGNER, RA .

APPLIED PHYSICS LETTERS, 1980, 37 (11) :993-995

[3]

Kitayama M., 1983, Japanese Journal of Applied Physics, Supplement, V22, P139

[4] ACOUSTIC BULK WAVE COMPOSITE RESONATORS [J].

LAKIN, KM ;

WANG, JS .

APPLIED PHYSICS LETTERS, 1981, 38 (03) :125-127

[5] MEASUREMENT OF ELASTIC CONSTANTS AT LOW TEMPERATURES BY MEANS OF ULTRASONIC WAVES - DATA FOR SILICON AND GERMANIUM SINGLE CRYSTALS, AND FOR FUSED SILICA [J].

MCSKIMIN, HJ .

JOURNAL OF APPLIED PHYSICS, 1953, 24 (08) :988-997

[6] ZNO/SIO2/SI DIAPHRAGM BULK ACOUSTIC-WAVE COMPOSITE RESONATORS [J].

MIYASAKA, Y ;

HOSHINO, S ;

TAKAHASHI, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 :119-121

[7] ZNO-SIO2-DIAPHRAGM COMPOSITE RESONATOR ON A SILICON-WAFER [J].

NAKAMURA, K ;

SASAKI, H ;

SHIMIZU, H .

ELECTRONICS LETTERS, 1981, 17 (14) :507-509

[8]

NAKAMURA K, 1972, T IECE JAP A, V55, P95

[9]

NAKAMURA K, 1980, 1980 P AUT M AC SOC, P127

[10]

NAKAMURA K, 1976, T IECE JAPAN A, V59, P985

← 1 2 →