CRYSTALLIZATION OF GE AND SI IN METAL-FILMS .2.

被引：41

作者：

SIGURD, D ^{[1
]}

OTTAVIAN.G ^{[1
]}

ARNAL, HJ ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91109

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 04期

关键词：

D O I：

10.1063/1.1663484

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1740 / 1745

页数：6

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