THE ROLE OF THE INTERFACIAL SIOX LAYER IN SNO2/N-SI PHOTOCELLS

被引：9

作者：

BADAWY, W ^{[1
]}

DOBLHOFER, K ^{[1
]}

机构：

[1] MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1984年 / 35卷 / 03期

关键词：

D O I：

10.1007/BF00616973

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：189 / 192

页数：4

共 17 条

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