OBSERVATION OF AN ANOMALOUSLY HIGH ETCH RATE IN PLASMA-ENHANCED CVD SILICON-NITRIDE FILMS

被引：2

作者：

LING, CH

KWOK, CY

PRASAD, K

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 84卷 / 01期

关键词：

D O I：

10.1002/pssa.2210840144

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：K1 / K4

页数：4

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