FERMI LEVEL PINNING DURING OXIDATION OF ATOMICALLY CLEAN N-INP(110)

被引：52

作者：

BERTNESS, KA

KENDELEWICZ, T

LIST, RS

WILLIAMS, MD

LINDAU, I

SPICER, WE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573525

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1424 / 1426

页数：3

共 12 条

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