ELECTRON-BEAM LITHOGRAPHY AND NANOMETER STRUCTURES - FABRICATION OF MICROZONE PLATES

被引：6

作者：

BOGLI, V ^{[1
]}

UNGER, P ^{[1
]}

BENEKING, H ^{[1
]}

NIEMANN, B ^{[1
]}

GUTTMANN, P ^{[1
]}

MEYERILSE, W ^{[1
]}

机构：

[1] UNIV GOTTINGEN, FORSCHUNGSGRP RONTGENMIKROSKOPIE, D-3400 GOTTINGEN, FED REP GER

来源：

OPTICAL ENGINEERING | 1988年 / 27卷 / 02期

关键词：

D O I：

10.1117/12.7976659

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：143 / 149

页数：7

共 21 条

[1]

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[3]

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[5]

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[7] DEVICE FABRICATION BY NANOLITHOGRAPHY AND ELECTROPLATING FOR MAGNETIC-FLUX QUANTIZATION MEASUREMENTS [J].

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ERKO, A ;

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[8]

KRATSCHMER E, 1983, 1983 P MICR ENG, P15

[9]

KRATSCHMER E, 1984, 1984 P MICR ENG, P203

[10] SPATIAL-RESOLUTION LIMITS IN ELECTRON-BEAM NANOLITHOGRAPHY [J].

KYSER, DF .

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