FINITE-ELEMENT MODELING AND X-RAY-MEASUREMENT OF STRAIN IN PASSIVATED AL LINES DURING THERMAL CYCLING

被引:21
作者
BESSER, PR [1 ]
MACK, AS [1 ]
FRASER, DB [1 ]
BRAVMAN, JC [1 ]
机构
[1] INTEL CORP,COMPONENTS RES,SANTA CLARA,CA 95051
关键词
D O I
10.1149/1.2221639
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Narrow-pitch encapsulated Al lines are used as interconnect metallization in integrated circuits. We have measured the principal strain state of Al alloy lines passivated with silicon nitride directly as a function of temperature. We compare these results with calculations of the strain state in these lines using finite-element modeling. The measured strain-temperature behavior shows good fundamental agreement with finite-element modeling, although the magnitude of the strains measured with x-rays is less than that predicted by modeling due to voiding in the lines.
引用
收藏
页码:1769 / 1772
页数:4
相关论文
共 24 条
  • [11] STRESS IN METAL LINES UNDER PASSIVATION - COMPARISON OF EXPERIMENT WITH FINITE-ELEMENT CALCULATIONS
    GREENEBAUM, B
    SAUTER, AI
    FLINN, PA
    NIX, WD
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (17) : 1845 - 1847
  • [12] VOID FORMATION MECHANISM IN VLSI ALUMINUM METALLIZATION
    HINODE, K
    ASANO, I
    HOMMA, Y
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (06) : 1050 - 1055
  • [13] JAMES MR, 1980, TREATISE MATERIALS A, V19, P1
  • [14] MADDEN MC, 1992, MATER RES SOC SYMP P, V265, P33, DOI 10.1557/PROC-265-33
  • [15] RADLER MJ, 1992, MRS S P, V264
  • [16] THERMAL-STRESSES IN ALUMINUM LINES BONDED TO SUBSTRATES
    SAUTER, AI
    NIX, WD
    [J]. IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1992, 15 (04): : 594 - 600
  • [17] Segmuller A., 1988, TREATISE MAT SCI TEC, P143, DOI [10.1016/ B978-0-12-341827-2.50010-8, DOI 10.1016/B978-0-12-341827-2.50010-8]
  • [18] STRAIN GRADIENTS IN AL-2-PERCENT CU THIN-FILMS
    SHUTE, CJ
    COHEN, JB
    [J]. JOURNAL OF APPLIED PHYSICS, 1991, 70 (04) : 2104 - 2110
  • [19] Tezaki A., 1990, 28th Annual Proceedings. Reliability Physics 1990 (Cat. No.90CH2787-0), P221, DOI 10.1109/RELPHY.1990.66090
  • [20] VASSAMILLET LF, 1963, ADVAN XRAY ANAL, V6, P142