DEPOSITION CHEMISTRY AND STRUCTURE OF PLASMA-DEPOSITED SILICON-NITRIDE FILMS FROM 1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE

被引：22

作者：

BROOKS, TA

HESS, DW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 02期

关键词：

D O I：

10.1063/1.341935

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：841 / 848

页数：8

相关论文

共 46 条

[1] ADAMS AC, 1986, REDUCED TEMPERATURE, P111
[2] DOPING EFFECTS IN OFF-STOICHIOMETRIC GLOW-DISCHARGE AMORPHOUS-SILICON NITRIDE
ALVAREZ, F
CHAMBOULEYRON, I
CONSTANTINO, C
CISNEROS, JI
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 116 - 118
[3] RADICAL MOLECULE AND ION-MOLECULE MECHANISMS IN THE POLYMERIZATION OF HYDROCARBONS AND CHLOROSILANES IN RF PLASMAS AT LOW-PRESSURES (BELOW 1.0 TORR)
AVNI, R
CARMI, U
INSPEKTOR, A
ROSENTHAL, I
[J]. THIN SOLID FILMS, 1984, 118 (02) : 231 - 241
[4] THE ROLE OF HYDROGEN IN THE RADICAL POLYMERIZATION MECHANISM OF HYDROCARBONS AND CHLOROSILANES IN A LOW-PRESSURE MICROWAVE PLASMA
AVNI, R
CARMI, U
INSPEKTOR, A
ROSENTHAL, I
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (04): : 1813 - 1820
[5] BEATTY CL, 1984, ULTRASTRUCTURE PROCE, P272
[6] Bell A. T., 1974, Techniques and applications of plasma chemistry, P1
[7] BELYI VI, 1986, MIKROELECTRONICA, V15, P146
[8] PREPARATION AND CHARACTERIZATION OF PLASMA-DEPOSITED SILICON-NITRIDE
BLAAUW, C
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) : 1114 - 1118
[9] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE FROM 1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE AND AMMONIA
BROOKS, TA
HESS, DW
[J]. THIN SOLID FILMS, 1987, 153 : 521 - 529
[10] PROPERTIES OF SILICON-NITRIDE FILMS PRODUCED BY RF PLASMA-ACTIVATED CHEMICAL VAPOR-DEPOSITION
CATHERINE, Y
TURBAN, G
[J]. THIN SOLID FILMS, 1977, 41 (03) : L57 - L90

← 1 2 3 4 5 →