SILICON LATTICE MEASUREMENT WITH AN IMPROVED X-RAY OPTICAL INTERFEROMETER

被引：5

作者：

NAKAYAMA, K

FUJIMOTO, H

TANAKA, M

KURODA, K

机构：

[1] National Research Laboratory of Metrology, Tsukuba, lbaraki, 305, Umezono

[2] National Research Laboratory of Metrology, Institute of Cosmic Ray Research, Tanashi, Tokyo, 188, Midori-cho

来源：

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT | 1993年 / 42卷 / 02期

关键词：

D O I：

10.1109/19.278590

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An X-ray/optical interferometer (XROI) with a new translation stage has been constructed and a preliminary measurement has been made of the (220) lattice spacing of a silicon crystal in air. We report the current status of the measurement.

引用

页码：401 / 404

页数：4

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