FLATNESS, CONTRAST, AND RESOLUTION CONSIDERATIONS OF CATHODE PROJECTION MICROFABRICATION SYSTEMS

被引：10

作者：

WARDLY, GA ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568526

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1313 / 1316

页数：4

共 15 条

[1]

DENHARTOG JP, 1952, ADV STRENGTH MATERIA

[2]

Fay B., 1973, Optics Communications, V9, P424, DOI 10.1016/0030-4018(73)90287-3

[3]

FAY B, 1974, 6TH INT C EL ION BEA, V1, P527

[4] EXPOSURE MODEL FOR ELECTRON-SENSITIVE RESISTS [J].

GREENEICH, JS ;

VANDUZER, T .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (05) :286-299

[5] SOLUBILITY RATE OF POLY-(METHYL METHACRYLATE), PMMA, ELECTRON-RESIST [J].

GREENEICH, JS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) :1669-1671

[6] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J].

HAWRYLUK, RJ ;

HAWRYLUK, AM ;

SMITH, HI .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2551-2566

[7]

KYSER DF, 1974, 6TH INT C EL ION BEA, V1, P205

[8] ELECTRON IMAGE PROJECTION SYSTEMS FOR MICROCIRCUIT LITHOGRAPHY [J].

LIVESAY, WR ;

FRITZ, RB .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) :647-&

[9] LSI PATTERN GENERATION AND REPLICATION BY ELECTRON-BEAMS [J].

MALMBERG, PR ;

OKEEFFE, TW ;

SOPIRA, MM ;

LEVI, MW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1025-1027

[10]

MARGENAU H, 1962, MATHEMATICS PHYSICS

← 1 2 →