THIN-FILMS OF MOLYBDENUM AND TUNGSTEN DISULFIDES BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION

[1] Al-Hilli AA., 1972, J CRYST GROWTH, V15, P93, DOI 10.1016/0022-0248(72)90129-7

[2] Bartram S.F., 1967, HDB XRAYS

[3] BERNEDE JC, 1987, MAR P INT S TRENDS N, V1, P21

[4] CORRELATION BETWEEN PROCESS CONDITIONS, CHEMICAL-COMPOSITION AND MORPHOLOGY OF MOS2 FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (08) : 1575 - 1585

[5] INFLUENCE OF PROCESS CONDITIONS ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF RF MAGNETRON SPUTTERED MOS2 FILMS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (09) : 1809 - &

[6] BRIXNER HL, 1963, J ELECTROCHEM SOC, V110, P289

[7] UBER WOLFRAMSULFIDE UND WOLFRAMSELENIDE [J]. ZEITSCHRIFT FUR ANORGANISCHE CHEMIE, 1948, 257 (5-6): : 241 - 246

[8] HOFMANN WK, 1986, J CRYSTAL GROWTH, V75, P93

[9] INTERRELATIONSHIPS BETWEEN PROCESS PARAMETERS, STRUCTURE, AND PROPERTIES OF CVD TUNGSTEN AND TUNGSTEN-RHENIUM ALLOYS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 701 - 708

[10] DEPOSITION OF MOLYBDENUM AND TUNGSTEN FILMS FROM VAPOR DECOMPOSITION OF CARBONYLS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (05) : 693 - &

[1] Al-Hilli AA., 1972, J CRYST GROWTH, V15, P93, DOI 10.1016/0022-0248(72)90129-7

[2] Bartram S.F., 1967, HDB XRAYS

[3] BERNEDE JC, 1987, MAR P INT S TRENDS N, V1, P21

[4] CORRELATION BETWEEN PROCESS CONDITIONS, CHEMICAL-COMPOSITION AND MORPHOLOGY OF MOS2 FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (08) : 1575 - 1585

[5] INFLUENCE OF PROCESS CONDITIONS ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF RF MAGNETRON SPUTTERED MOS2 FILMS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (09) : 1809 - &

[6] BRIXNER HL, 1963, J ELECTROCHEM SOC, V110, P289

[7] UBER WOLFRAMSULFIDE UND WOLFRAMSELENIDE [J]. ZEITSCHRIFT FUR ANORGANISCHE CHEMIE, 1948, 257 (5-6): : 241 - 246

[8] HOFMANN WK, 1986, J CRYSTAL GROWTH, V75, P93

[9] INTERRELATIONSHIPS BETWEEN PROCESS PARAMETERS, STRUCTURE, AND PROPERTIES OF CVD TUNGSTEN AND TUNGSTEN-RHENIUM ALLOYS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 701 - 708

[10] DEPOSITION OF MOLYBDENUM AND TUNGSTEN FILMS FROM VAPOR DECOMPOSITION OF CARBONYLS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (05) : 693 - &