ION-ASSISTED DEPOSITION OF TA2O5 AND AL2O3 THIN-FILMS

被引:22
作者
MCNALLY, JJ
ALJUMAILY, GA
MCNEIL, JR
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573899
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:437 / 439
页数:3
相关论文
共 9 条
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    [J]. APPLIED OPTICS, 1984, 23 (04): : 552 - 559
  • [8] PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION
    MCNEIL, JR
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    [J]. APPLIED OPTICS, 1985, 24 (04): : 486 - 489
  • [9] PROPERTIES OF CEO2 THIN-FILMS PREPARED BY OXYGEN-ION-ASSISTED DEPOSITION
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    [J]. APPLIED OPTICS, 1985, 24 (14): : 2267 - 2272