PULSED PROTON-BEAM ANNEALING OF IR AND IRXV100-X THIN-FILMS ON SILICON

被引：4

作者：

BRAT, T

EIZENBERG, M

FASTOW, R

PALMSTROM, CJ

MAYER, JW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 02期

关键词：

D O I：

10.1063/1.334798

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：264 / 269

页数：6

共 21 条

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