SPECTRAL RESPONSE OF A PHOTODIODE USING 3C-SIC SINGLE-CRYSTALLINE FILM

被引:18
作者
HIRABAYASHI, Y [1 ]
KARASAWA, S [1 ]
KOBAYASHI, K [1 ]
MISAWA, S [1 ]
YOSHIDA, S [1 ]
机构
[1] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN
关键词
D O I
10.1016/0924-4247(93)00687-Y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
3C-SiC/Si heterojunction photodiodes and 3C-SiC homojunction photodiodes have been fabricated by atmospheric chemical vapor deposition. The maximum quantum efficiency of heterojunction photodiodes with a window layer of 10 mum thick is 80% at 550 nm. An increase in the thickness of the SiC layer reduces the responsivity in wavelength regions shorter and longer than 500-550 nm. 3C-SiC self supported films of 20 mum thick, epitaxially grown on Si, have been used as substrates for homojunction photodiodes. The responsivity of the homojunction photodiode with a window layer thickness of 0.5 mum is 72 mA/W at 250 nm with a quantum efficiency of 36%. When the thickness of the window layer is decreased, the peak responsivity increases and the peak wavelength shifts to a shorter wavelength. These spectral responsivities are discussed together with the results of calculations using a one-dimensional model.
引用
收藏
页码:164 / 169
页数:6
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