ELECTROCHEMICAL AND PHOTOELECTROCHEMICAL BEHAVIOR AND SELECTIVE ETCHING OF III-V SEMICONDUCTORS IN H2O2 AS REDOX SYSTEM

被引:28
作者
HAROUTIOUNIAN, E [1 ]
SANDINO, JP [1 ]
CLECHET, P [1 ]
LAMOUCHE, D [1 ]
MARTIN, JR [1 ]
机构
[1] ECOLE CENT LYON, PHYSICOCHIM INTERFACES LAB, F-69130 ECULLY, FRANCE
关键词
D O I
10.1149/1.2115537
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:27 / 34
页数:8
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