PROGRESS TOWARD SINGLE CRYSTAL SILICON FILMS ON AMORPHOUS SUBSTRATES

[1] EPITAXIAL DEPOSITION OF SILICON ON QUARTZ [J]. PHILOSOPHICAL MAGAZINE, 1964, 9 (102): : 965 - &

[2] THIN SILICON FILM GROWTH ON POLYCRYSTALLINE ALUMINA CERAMIC [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (10) : 1196 - 1198

[3] LOW-TEMPERATURE EPITAXY OF SILICON BY SUBLIMATION ONTO THIN ALLOY LAYERS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (05) : 535 - &

[4] FILBY JD, 1965, MICROELECTRONICS REL, V4

[5] FILBY JD, 1965, J ELECTROCHEM SOC, V112, P534

[6] FILBY JD, 1965, INTERNATIONAL VACUUM

[7] THE USE OF A METASTABLE PHASE IN THIN ALLOY ZONE CRYSTALLIZATION [J]. SOLID STATE COMMUNICATIONS, 1964, 2 (07) : 197 - 199

[8] EPITAXIAL DEPOSITION OF SILICON ON QUARTZ [J]. SOLID STATE COMMUNICATIONS, 1963, 1 (05) : 107 - 108

[9] SINGLE-CRYSTAL SILICON ON SAPPHIRE SUBSTRATE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) : 1349 - &

[10] Newman R.C., 1964, MICROELECTRON RELIAB, V3, P121

[1] EPITAXIAL DEPOSITION OF SILICON ON QUARTZ [J]. PHILOSOPHICAL MAGAZINE, 1964, 9 (102): : 965 - &

[2] THIN SILICON FILM GROWTH ON POLYCRYSTALLINE ALUMINA CERAMIC [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (10) : 1196 - 1198

[3] LOW-TEMPERATURE EPITAXY OF SILICON BY SUBLIMATION ONTO THIN ALLOY LAYERS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (05) : 535 - &

[4] FILBY JD, 1965, MICROELECTRONICS REL, V4

[5] FILBY JD, 1965, J ELECTROCHEM SOC, V112, P534

[6] FILBY JD, 1965, INTERNATIONAL VACUUM

[7] THE USE OF A METASTABLE PHASE IN THIN ALLOY ZONE CRYSTALLIZATION [J]. SOLID STATE COMMUNICATIONS, 1964, 2 (07) : 197 - 199

[8] EPITAXIAL DEPOSITION OF SILICON ON QUARTZ [J]. SOLID STATE COMMUNICATIONS, 1963, 1 (05) : 107 - 108

[9] SINGLE-CRYSTAL SILICON ON SAPPHIRE SUBSTRATE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) : 1349 - &

[10] Newman R.C., 1964, MICROELECTRON RELIAB, V3, P121