SOLID-PHASE CRYSTALLIZATION KINETICS IN DOPED ALPHA-SI CHEMICAL-VAPOR-DEPOSITION FILMS

被引：65

作者：

BISARO, R

MAGARINO, J

ZELLAMA, K

SQUELARD, S

GERMAIN, P

MORHANGE, JF

机构：

[1] UNIV PARIS 07,ECOLE NORMALE SUPER,PHYS SOLIDES GRP,F-75221 PARIS 05,FRANCE

[2] UNIV PARIS 06,PHYS SOLIDE LAB,F-75230 PARIS 05,FRANCE

来源：

PHYSICAL REVIEW B | 1985年 / 31卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.31.3568

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3568 / 3575

页数：8

共 24 条

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