PROPERTIES OF SI-RICH SINX-H FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引:12
作者
KAYA, C
MA, TP
CHEN, TC
BARKER, RC
机构
[1] YALE UNIV,CTR MICROELECTR MAT & STRUCT,NEW HAVEN,CT 06520
[2] YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
关键词
D O I
10.1063/1.341352
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:3949 / 3957
页数:9
相关论文
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