INSITU OHMIC-CONTACT FORMATION TO N-GAAS AND P-GAAS BY MOLECULAR-BEAM EPITAXY

被引:34
作者
TSANG, WT
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10.1063/1.90254
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O59 [应用物理学];
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页码:1022 / 1025
页数:4
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[11]   LOW-TEMPERATURE ALLOY CONTACTS TO GALLIUM ARSENIDE USING METAL HALIDE FLUXES [J].
SCHWARTZ, B ;
SARACE, JC .
SOLID-STATE ELECTRONICS, 1966, 9 (09) :859-&
[12]   THIN-PHASE EPITAXY FOR GOOD SEMICONDUCTOR METAL OHMIC CONTACTS [J].
SEBESTYEN, T ;
HARTNAGEL, HL ;
HERRON, LH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, 22 (12) :1073-1077
[13]   SINTERED OHMIC CONTACTS TO N-TYPE AND P-TYPE GAAS [J].
SINHA, AK ;
SMITH, TE ;
LEVINSTEIN, HJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (05) :218-224
[14]   LATERAL-CURRENT CONFINEMENT IN A GAAS PLANAR STRIPE-GEOMETRY AND CHANNELED SUBSTRATE BURIED DH LASER USING REVERSE-BIASED P-N-JUNCTIONS [J].
TSANG, WT ;
LOGAN, RA .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) :2629-2638