DISK HYDROGEN PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION OF ALUMINUM NITRIDE

被引：49

作者：

SHENG, TY

YU, ZQ

COLLINS, GJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 07期

关键词：

D O I：

10.1063/1.99398

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：576 / 578

页数：3

共 19 条

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