CHARGE CARRIER LIFETIME MEASUREMENTS ON HIGH-PURITY SILICON

被引:9
作者
VANWIJNEN, PJ
TENKATE, WRT
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关键词
D O I
10.1016/0168-9002(87)90516-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:351 / 359
页数:9
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[2]   FABRICATION OF LOW-NOISE SILICON RADIATION DETECTORS BY THE PLANAR PROCESS [J].
KEMMER, J .
NUCLEAR INSTRUMENTS & METHODS, 1980, 169 (03) :499-502
[3]  
NICOLLIAN EH, 1982, MOS PHYSICS TECHNOLO
[4]   THE ANNEALING OF 1-MEV IMPLANTATIONS OF BORON IN SILICON [J].
OOSTERHOFF, S ;
MIDDELHOEK, J .
SOLID-STATE ELECTRONICS, 1985, 28 (05) :427-433
[6]  
RUNYAN WR, 1975, SEMICONDUCTOR MEASUR, P105
[7]   THE CONCEPT OF GENERATION AND RECOMBINATION LIFETIMES IN SEMICONDUCTORS [J].
SCHRODER, DK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (08) :1336-1338
[8]   EFFECTIVE LIFETIMES IN HIGH-QUALITY SILICON DEVICES [J].
SCHRODER, DK .
SOLID-STATE ELECTRONICS, 1984, 27 (03) :247-251
[9]   STATISTICS OF THE RECOMBINATIONS OF HOLES AND ELECTRONS [J].
SHOCKLEY, W ;
READ, WT .
PHYSICAL REVIEW, 1952, 87 (05) :835-842
[10]  
SZE SM, 1981, PHYSICS SEMICONDUCTO