POSITIVE ELECTRON-BEAM RESIST BEHAVIOR FOR METHACRYLONITRILE AND METHYL ALPHA-CHLOROACRYLATE POLYMERS AND CO-POLYMERS

被引：21

作者：

LAI, JH

HELBERT, JN

COOK, CF

PITTMAN, CU

机构：

[1] USA,ELECTR TECHNOL & DEVICES LAB,ERADCOM,FT MONMOUTH,NJ 07703

[2] UNIV ALABAMA,UNIVERSITY,AL 35486

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570374

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1992 / 1995

页数：4

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