APPLICATIONS OF ELECTRON-BEAM EXPOSURE SYSTEM

被引：10

作者：

PEASE, RFW ^{[1
]}

BALLANTYNE, JP ^{[1
]}

HENDERSON, RC ^{[1
]}

VOSHCHENKOV, AM ^{[1
]}

YAU, LD ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1975年 / ED22卷 / 07期

关键词：

D O I：

10.1109/T-ED.1975.18150

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：393 / 399

页数：7

相关论文

共 21 条

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