CRYSTALLIZATION KINETICS OF AMORPHOUS SI/SIO2 SUPERLATTICE STRUCTURES

被引:50
作者
PERSANS, PD
RUPPERT, A
ABELES, B
机构
[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,TROY,NY 12180
[2] EXXON RES & ENGN CO,ANNANDALE,NJ 08801
关键词
D O I
10.1016/0022-3093(88)90123-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:130 / 135
页数:6
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