共 19 条
[1]
Andersen H. H., 1984, Ion implantation and beam processing, P127
[2]
SURFACE SEGREGATION DURING ALLOY SPUTTERING AND IMPLANTATION
[J].
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH,
1983, 209 (MAY)
:487-494
[3]
ANDERSEN N, 1974, K DAN VIDENSK SELSK, V39
[4]
Betz G., 1983, SPUTTERING PARTICLE, P11
[5]
COMPUTER-SIMULATION OF 2-COMPONENT TARGET SPUTTERING
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
1985, 37 (02)
:95-108
[7]
SIGNIFICANCE OF ISOTOPE EFFECTS FOR SECONDARY-ION EMISSION MODELS
[J].
PHYSICAL REVIEW B,
1988, 38 (16)
:11112-11117
[8]
GNASER H, IN PRESS
[9]
QUANTITATIVE DEPTH PROFILE AND BULK ANALYSIS WITH HIGH DYNAMIC-RANGE BY ELECTRON-GAS SPUTTERED NEUTRAL MASS-SPECTROMETRY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1988, 6 (04)
:2271-2279