SUBSTRATE THICKNESS CONSIDERATIONS IN ELECTRON-BEAM LITHOGRAPHY

被引：6

作者：

ADESIDA, I

EVERHART, TE

机构：

[1] UNIV CALIF BERKELEY, DEPT ELECT ENGN, BERKELEY, CA 94720 USA

[2] UNIV CALIF BERKELEY, ELECTR RES LAB, BERKELEY, CA 94720 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 11期

关键词：

D O I：

10.1063/1.327521

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5994 / 6005

页数：12

共 53 条

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[2] HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN-FILMS [J].

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EVERHART, TE ;

SHIMIZU, R .

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[3]

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[4]

ADESIDA I, 1980, J APPL PHYS, V51

[5]

Baran E. F., 1977, IBM Technical Disclosure Bulletin, V19

[6]

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BALLANTYNE, JP .

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[8] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J].

BROERS, AN ;

MOLZEN, WW ;

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WITTELS, ND .

APPLIED PHYSICS LETTERS, 1976, 29 (09) :596-598

[9] 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST [J].

BROERS, AN ;

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MOLZEN, WW .

APPLIED PHYSICS LETTERS, 1978, 33 (05) :392-394

[10]

CHUNG MSC, 1978, 8TH INT C EL ION BEA, P242

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