INSITU ELLIPSOMETRIC CHARACTERIZATION AND PROCESS-CONTROL FOR AMORPHOUS THIN-FILM DEPOSITION

被引：3

作者：

COLLINS, RW ^{[1
]}

机构：

[1] BP AMER,RES & DEV,CLEVELAND,OH 44128

来源：

SUPERLATTICES AND MICROSTRUCTURES | 1988年 / 4卷 / 06期

关键词：

D O I：

10.1016/0749-6036(88)90204-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：729 / 736

页数：8

共 28 条

[1]

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[2]

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[10] INSITU ELLIPSOMETRY COMPARISON OF THE NUCLEATION AND GROWTH OF SPUTTERED AND GLOW-DISCHARGE A-SI-H [J].

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