THE BACKSIDE PULSE DOPED CHANNEL HETEROSTRUCTURE FIELD-EFFECT TRANSISTOR - DESIGN, DC, AND RF PERFORMANCE

被引:5
作者
DICKMANN, J
机构
[1] Daimler-Benz AG, Institute for Information Technology, Ulm, D-7900
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 1A期
关键词
DOPED CHANNEL HFET; HETEROJUNCTION FET; PSEUDOMORPHIC HFET; MICROWAVE DEVICES; MOLECULAR BEAM EPITAXY;
D O I
10.1143/JJAP.32.17
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report about a theoretical and experimental study of AlGaAs/InGaAs modulation doped field-effect transistors (MODFETs) having doped channels. On the basis of self consistent calculations we suggest design rules of where to introduce the channel doping into the channel to obtain high speed devices with high saturation currents and reasonable low noise performance. For a 0.35 mum gate length backside pulse doped channel device (BSPDC-HFET) with 120 mum gate width a maximum transconductance of 625 mS/mm and a maximum saturation current at V(GS) = +0.8 V of 720 mA/mm have been measured. The cut-off frequencies are f(T) = 80 GHz, f(max) = 195 GHz. At 18 GHz a minimum noise figure of NF = 1.1 dB with 17 dB associated gain were measured.
引用
收藏
页码:17 / 25
页数:9
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