HIGHLY ORIENTED POLYCRYSTALLINE SI FILM ON QUARTZ GROWN FROM SI3H8 BY THERMAL AND PHOTO-CVD

被引：10

作者：

FUJIKI, N

NAKATANI, Y

INOUE, K

OKUYAMA, M

HAMAKAWA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 05期

关键词：

D O I：

10.1143/JJAP.28.829

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：829 / 835

页数：7

共 26 条

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