OXYGEN SOLUBILITY IN LIQUID SILICON IN EQUILIBRIUM WITH SIO AND SIO2

[1] DYNAMIC OXYGEN EQUILIBRIUM IN SILICON MELTS DURING CRYSTAL-GROWTH BY THE CZOCHRALSKI TECHNIQUE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (01) : 189 - 193

[2] CALCULATED SOLUBILITIES OF OXYGEN IN LIQUID AND SOLID SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (09) : 1940 - 1942

[3] DISSOLUTION OF FUSED SILICA IN MOLTEN SILICON [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 33 (01) : 188 - 190

[4] GELD PV, 1948, ZH PRIKL KHIM, V21, P1249

[5] OXYGEN CONTENT OF SILICON SINGLE CRYSTALS [J]. JOURNAL OF APPLIED PHYSICS, 1957, 28 (08) : 882 - 887

[6] Kubaschewski O., 1979, METALLURGICAL THERMO

[7] MOODY JW, 1984, SEMICONDUCTOR SILIC, V86, P100

[8] THERMODYNAMIC STUDY OF OXYGEN IN LIQUID ELEMENTS OF GROUP-IB TO GROUP-VIB [J]. TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1981, 22 (08): : 558 - 566

[9] SMITHELLS CJ, 1976, METAL REFERENCE BOOK, P188

[10] SILICON OXYHYDRIDE [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1952, 44 (02): : 321 - 326

[1] DYNAMIC OXYGEN EQUILIBRIUM IN SILICON MELTS DURING CRYSTAL-GROWTH BY THE CZOCHRALSKI TECHNIQUE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (01) : 189 - 193

[2] CALCULATED SOLUBILITIES OF OXYGEN IN LIQUID AND SOLID SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (09) : 1940 - 1942

[3] DISSOLUTION OF FUSED SILICA IN MOLTEN SILICON [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 33 (01) : 188 - 190

[4] GELD PV, 1948, ZH PRIKL KHIM, V21, P1249

[5] OXYGEN CONTENT OF SILICON SINGLE CRYSTALS [J]. JOURNAL OF APPLIED PHYSICS, 1957, 28 (08) : 882 - 887

[6] Kubaschewski O., 1979, METALLURGICAL THERMO

[7] MOODY JW, 1984, SEMICONDUCTOR SILIC, V86, P100

[8] THERMODYNAMIC STUDY OF OXYGEN IN LIQUID ELEMENTS OF GROUP-IB TO GROUP-VIB [J]. TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1981, 22 (08): : 558 - 566

[9] SMITHELLS CJ, 1976, METAL REFERENCE BOOK, P188

[10] SILICON OXYHYDRIDE [J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1952, 44 (02): : 321 - 326