COBALT SILICIDE LAYERS ON SI .1. STRUCTURE AND GROWTH

[1] IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION [J]. APPLIED PHYSICS LETTERS, 1974, 25 (08) : 454 - 457

[2] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J]. THIN SOLID FILMS, 1975, 25 (02) : 393 - 402

[3] STRUCTURE OF ELECTROPLATED AND VAPOR-DEPOSITED COPPER-FILMS .3. RECRYSTALLIZATION AND GRAIN-GROWTH [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (09) : 3749 - 3756

[4] GUMEN NM, 1972, FIZ MET METALLOVED+, V34, P776

[5] GUMEN NM, 1972, PHYS MET METALLOGR, V34, P98

[6] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[7] SOME ASPECTS OF THE GROWTH OF DIFFUSION LAYERS IN BINARY SYSTEMS [J]. JOURNAL OF NUCLEAR MATERIALS, 1961, 3 (01) : 21 - 29

[8] Lepselter M. P., 1969, Ohmic contacts to semiconductors, P159

[9] REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (10) : 4366 - 4369

[10] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 86 - 93

[1] IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION [J]. APPLIED PHYSICS LETTERS, 1974, 25 (08) : 454 - 457

[2] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J]. THIN SOLID FILMS, 1975, 25 (02) : 393 - 402

[3] STRUCTURE OF ELECTROPLATED AND VAPOR-DEPOSITED COPPER-FILMS .3. RECRYSTALLIZATION AND GRAIN-GROWTH [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (09) : 3749 - 3756

[4] GUMEN NM, 1972, FIZ MET METALLOVED+, V34, P776

[5] GUMEN NM, 1972, PHYS MET METALLOGR, V34, P98

[6] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[7] SOME ASPECTS OF THE GROWTH OF DIFFUSION LAYERS IN BINARY SYSTEMS [J]. JOURNAL OF NUCLEAR MATERIALS, 1961, 3 (01) : 21 - 29

[8] Lepselter M. P., 1969, Ohmic contacts to semiconductors, P159

[9] REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (10) : 4366 - 4369

[10] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 86 - 93