SILICON OXYNITRIDE - A MATERIAL FOR GRIN OPTICS

被引:126
作者
BAAK, T
机构
来源
APPLIED OPTICS | 1982年 / 21卷 / 06期
关键词
D O I
10.1364/AO.21.001069
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:1069 / 1072
页数:4
相关论文
共 29 条
[2]   TEMPERATURE-DEPENDENCE OF ABSORPTION-EDGE OF VITREOUS SILICA [J].
BATES, CW .
APPLIED OPTICS, 1976, 15 (12) :2976-2978
[3]   PROPERTIES OF SIXOYNZ FILMS ON SI [J].
BROWN, DM ;
GRAY, PV ;
HEUMANN, FK ;
PHILIPP, HR ;
TAFT, EA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) :311-&
[4]   FILMS OF SILICON NITRIDE-SILICON DIOXIDE MIXTURES [J].
CHU, TL ;
SZEDON, JR ;
LEE, CH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) :318-&
[5]  
ERNSBERGER FM, 1980, GLASS SCI TECHNOLOGY, V5
[6]  
FAJANS F, 1948, J AM CERAM SOC, V31, P105
[7]   PREPARATION OF NITROGEN-CONTAINING NA2O-CAO-SIO2 GLASSES [J].
FRISCHAT, GH ;
SCHRIMPF, C .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1980, 63 (11-1) :714-715
[8]   OXYNITRIDE DEPOSITION KINETICS IN A SIH4-CO2-NH3-H-2 SYSTEM [J].
GAIND, AK ;
ACKERMANN, GK ;
LUCARINI, VJ ;
BRATTER, RL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (04) :599-606
[9]   PHYSICOCHEMICAL PROPERTIES OF CHEMICAL VAPOR-DEPOSITED SILICON OXYNITRIDE FROM A SIH4-CO2-NH3-H2 SYSTEM [J].
GAIND, AK ;
HEARN, EW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (01) :139-145
[10]  
Jack K. H., 1977, NITROGEN CERAMICS