DEPOSITION OF III-V COMPOUNDS BY MO-CVD AND IN HALOGEN TRANSPORT-SYSTEMS - A CRITICAL COMPARISON

被引：9

作者：

BALK, P ^{[1
]}

VEUHOFF, E ^{[1
]}

机构：

[1] RHEIN WESTFAL TH AACHEN,SONDERFORSCH BEREICH FESTKORPERELEKTRON 56,D-5100 AACHEN,FED REP GER

来源：

JOURNAL OF CRYSTAL GROWTH | 1981年 / 55卷 / 01期

关键词：

D O I：

10.1016/0022-0248(81)90268-2

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：35 / 41

页数：7

相关论文

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